We systematically study the performance of compact lumped element planar microwave (NbTiN) resonators operating at 5 GHz in external in-plane magnetic fields up to 440 mT, a broad temperature regime from 2.2 K up to 13 K, as well as mK temperatures. For comparison, the resonators have been fabricated on thermally oxidized and pristine, (001) oriented silicon substrates. When operating the resonators in the multi-photon regime at K, we find internal quality factors for NbTiN resonators grown on pristine Si substrates, while resonators grown on thermally oxidized substrates show a reduced value of , providing evidence for additional loss channels for the latter substrate. In addition, we investigate the -factors of the resonators on pristine Si substrates at millikelvin temperatures to asses their applicability for quantum applications. We find in the single photon regime and in the high power regime at mK.

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