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The possibility of optimization of high voltage hybrid SIT-MOS transistors (HSMT) by local reduction of the lifetime near anode emitter and/or reduction of the anode emitter injection ability by three different ways has been investigated using two-dimensional numerical simulation. It has been shown that all of these methods proposed previously for optimization of insulated-gate bipolar transistor (IGBT) are physically equivalent and makes it possible to reduce turn-off energy losses in HSMT by 30-40%. Importantly that energy in optimized HSMT appears to be 15-35% less than in equivalent trench IGBT under other equal conditions.

生成讲解博客的中文版本

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