Ultra-high-ohmic microstripline resistors for Coulomb blockade devices

In this paper, we report on the fabrication and the low-temperature characterization of extremely high-ohmic microstrip resistors made of a thin film of weakly oxidized titanium. Nearly linear voltage-current characteristics were measured at temperatures down to $T\sim \text{unit}[20]mK$ for films with sheet resistivity up to as high as $\sim \text{unit}[7]k\mathrm{\Omega }$, i.e. about an order of magnitude higher than our previous findings for weakly oxidized Cr. Our analysis indicates that such an improvement can help to create an advantageous high-impedance environment for different Coulomb blockade devices. Further properties of the Ti film addressed in this work show a promise of low-noise behavior of the resistors when applied in different realizations of the quantum standard of current.