加载中…
The anomalous Hall effect (AHE) in the Heusler compounds CoFeSi and CoFeAl is studied in dependence of the annealing temperature to achieve a general comprehension of its origin. We have demonstrated that the crystal quality affected by annealing processes is a significant control parameter to tune the electrical resistivity as well as the anomalous Hall resistivity . Analyzing the scaling behavior of in terms of points to a temperature-dependent skew scattering as the dominant mechanism in both Heusler compounds.

生成讲解博客的中文版本

生成AI智能校验的中文版本