Resistance Switching Properties of Stoichiometric and Nitrogen Implanted Silicon Nitride Nanolayers on N and P-Type Si Substrates

This paper examines the resistive switching characteristics of LPCVD SiNx MNOS ReRAM cells on both heavily doped n- and p-type silicon substrates, focusing on the effects of nitrogen doping. Detailed comparisons of electrical properties through nitrogen implantation reveal variations in trap density and SET-RESET voltages between n and p conductivity Si substrates. Impedance spectroscopy further elucidates the conductive path formation and its resistance.